Beichen Li
Email: beichen {at} mit {dot} edu -- Actively seeking full-time research engineer/scientist positions
32-321
32 Vassar St (The Stata Center)
Cambridge, MA 02139
I’m a final-year PhD student in the Computational Fabrication and Design Group at MIT CSAIL, advised by Prof. Wojciech Matusik. Prior to attending MIT, I obtained a Bachelor’s degree in computer science from Tsinghua University, China.
My research interest lies in the intersection between computer graphics and machine learning, with a special focus on the following topics:
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Generative modeling of procedural materials. Procedural materials provide a fully editable node-graph representation of photorealistic material appearances but they are tedious to create and manipulate. My PhD tackles the challenging inverse problem--generating a procedural material to match a captured input image in appearance.
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Learning-accelerated computational design for scientific discovery. Leveraging neural networks as fast, differentiable surrogate models for expensive simulation or experimentation, I develop sample-efficient algorithms to identify Pareto-optimal designs among a combinatorial pool of candidates, which significantly reduces the effort from human trial-and-error.
During my past experience as a research assistant or intern, I was fortunate to be mentored by Prof. Shi-Min Hu from Tsinghua, Prof. Stelian Coros from CMU (now at ETH Zurich), and Dr. Miloš Hašan, Dr. Kalyan Sunkavalli, and Dr. Yiwei Hu from Adobe Research, to whom I’m deeply grateful.
News
Sep 12, 2024 | My recent work on RL fine-tuning for procedural material generation is accepted by SIGGRAPH Asia 2024. |
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Feb 04, 2024 | “Computational design of 3D-printable microstructures” has been published on Science Advances. |
Aug 20, 2023 | Differentiable Procedural material library, DiffMat v2, has been released on GitHub. |
Aug 14, 2023 | Concluded my second research internship at Adobe Research (primary mentor: Yiwei Hu). |
May 08, 2023 | My work on mixed-integer node parameter optimization for procedural material capture is accepted by SIGGRAPH 2023. |